The technical articles listed here provide information about the products and processes offered by NAURA Akrion. They are collected from presentations made at technical conferences and from articles published in industry newsletters and magazines.
- GAMA PTR Robot Controller Reset Issues
- IPA-free texturing for advanced solar cells (EUPVSEC 2014)
- Process control for KOH texturing (EUPVSEC 2014)
- Cost of ownership comparison of single wafer processes for stripping copper pillar bump photomasks (UCPSS 2014)
- Cost of ownership comparison of single wafer processes for stripping copper pillar bump photomasks (Poster)
- Process Control Challenges of Wet-Etching Large MEMS Si Cavities (UCPSS 2014)
- Wafer Surface Preparation for High Efficiency Solar Cells (IEEE PVSC 2014)
- Wet Chemical Processing with Megasonics Assist for the Removal of Bumping Process Photomasks (IMAPS 2014)
- How to Overcome the Effects of Silicon Build-up during Solar Cell Wet Processing (UCPSS2012)
- Optimized Wet Processes and PECVD for High Efficiency Solar Cells (UCPSS2012)
- CO2-Dissolved Water Cleans for 2x-nm Silicon Devices in a Single Wafer Megasonic System (UCPSS2012)
- Advanced Process Control of Chemical Concentration for Solar Cell Manufacturing (IEEE2012)
- Advanced Process Control of Chemical Concentration for Solar Cell Manufacturing (EUPVSEC 2011)
- Characterization of c-Si Texturization in Wet KOH/IPA and its Effect on Cell Efficiency (EUPVSEC 2011)
- Improving Solar Cell Efficiency (EU PVSEC 2010)
- HF-last Passivation for Heterojunction Solar Cells (UCPSS-2010)
- Single Wafer Back Side and Bevel Cleaning (UCPSS 2010)
- Surface Conditioning of Monocrystalline Silicon (EUPVSEC-2010)
- The Application of DIO3 Water on Wafer Surface Preparation
- Low Consumption Front End Of the Line Cleaning: LC-FEOL
- The Use of Ozonated HF Solutions for Polysilicon Stripping
- Evaluation of Advanced Pre-gate Cleanings
- HF Concentration Control in IC Manufacturing
- Using Ozonated-DI-water Technology for Photo Resist Removal
- Extending Reticle Life through Better Cleaning Budgets
- Goldfinger Megasonics Remove Chemically Amplified Photo Resist with Low Cost Solvents
- Effect of Pre-cleaning on Texturization of c-Si
- Insights into c-Si Processing for Photovoltaic Applications