Process and Equipment Solutions for Integrated Circuit Manufacturers
Integrated circuits (IC) are found in devices used in nearly every aspect of modern life. From business machines to cooking to entertainment, IC devices provide power and control. The vast variety of these devices makes flexible process solutions a necessity and NAURA Akrion specializes in providing this flexibility. We currently work with many of the world’s leading manufacturers of products containing integrated circuits. NAURA Akrion has solutions for IC manufactures ranging from logic and memory devices at the most advanced nodes to analog device manufacturers working with 0.5µm design rules.
You can rely on our team of material/chemical scientists (with 100 combined years of experience) to develop, refine and perfect the sophisticated wet processes required to make your most advanced products.
Depending on your particular needs in terms of throughput, feature size and defect level, NAURA Akrion has equipment that includes:
The Saqua series platform is a single wafer rotary wet cleaning system providing good cleaning selectivity and high cleaning efficiency with advanced technology including a chemical liquid protection system, pipeline anti-static system, and megasonic system. The residue is selectively cleaned without damaging the structure of the product itself.
The Pinnacle® Carrier-less Wet Station increases your Yield and Lowers your Costs. Available in 200mm and 300mm configurations. No carriers eliminate carrier-based defects such as shadowing or contact marks. Lowest capital equipment cost compared to competing systems. Minimal consumable costs and high throughput, low cost of ownership. Modular compact design, easily serviceable. Multi-tank plenum design.
The GAMA wet station series is a proven performer with hundreds of systems installed worldwide. A modular, flexible platform allows highly customized processes to meet the most demanding criteria. The system adapts to applications for both front-end-of-line and back-end-of-line process steps and accepts a wide variety of substrate materials. GAMA features closed loop process control to ensure consistent high quality to promote high yields for all wafer sizes.
V3 is the next generation of Semi-Automatic wet benches targeted to meet the needs of Semiconductor and MEMS companies who need the process capability, recipe flexibility, equipment reliability, company support and knowledge to back up a successful installation of the product. The system is particularly well suited to R&D and process development and for low volume manufacturing.
Sample Process Solutions
Particle Removal
NAURA Akrion has a broad product line for removal of residue and defects. Pinnacle is the newest addition to the product line and is recommended for the most advanced applications. The GAMA wet station is a proven performer for pre-diffusion and pre-gate cleans on devices utilizing features as small as 65 nm, while the V3 is available for low volume manufacturing of devices at the 180 nanometer process node.
Oxide Etching/Stripping
ICE-1™ controls chemical efficiency to assure controlled and uniform etching and stripping. The Pinnacle and GAMA systems utilize traditional HDA solvents as well as aqueous solutions for photo resist stripping.